Residual stress analysis in thick uranium films
نویسندگان
چکیده
منابع مشابه
Residual stress analysis in thick uranium films
Residual stress analysis was performed on thick, 1–25 lm, depleted uranium (DU) films deposited on an Al substrate by magnetron sputtering. Two distinct characterization techniques were used to measure substrate curvature before and after deposition. Stress evaluation was performed using the Benabdi/Roche equation, which is based on beam theory of a bi-layer material. The residual stress evolut...
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ژورنال
عنوان ژورنال: Journal of Nuclear Materials
سال: 2005
ISSN: 0022-3115
DOI: 10.1016/j.jnucmat.2005.03.024